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TECHNOLOGIES & APPLICATIONS

VACUUM ION-PLASMA SETUP “DUET”


Vacuum ion-plasma setup "DUET"

The installation provides vacuum arc discharge plasma-assisted deposition of functional coatings on a surface of the most deman-ding parts of units and devices as well as various instruments with the goal of enhancing their life-time and improving the furni-shing.

The installation allows to realize the complex technology in a single vacuum cycle:

  • finishing ion-plasma cleaning and activation of a surface of articles;
  • production of a hard (5-7 GPa) nitrided sublayer;
  • deposition of superhard (20-40 GPa) submicro- and nanostructural composite film (like TiN, etc) of width 3-5 чm.
Setup "DUET" main parameters:
Vacuum chamber dimensions 650x650x750 mm3
Manipulator 12 positions
Operating pressure10-1—1 Pa
Plasmagenerator currentup to 80 A
Arc evaporator currentup to 150 A
Bias voltageup to 1000 V
Power supply:
Mains voltage
Number of phases
Frequency
Power
380/220 V
3
50 Hz
up to 50 kW
Water-cooling runoffnot more than 2 m3/h

Advantages

  • the total technological process of pieces surface modification is realized in vacuum and is ecologically clean;
  • a non-self-maintained arc discharge allows to efficiently generate a low-temperature plasma over the whole setup operating volume providing high quality of ion-plasma treatment;
  • a high-adhesive coatings possessing an improved operating performance are formed.

For further information please contact:


Nikolai N. Koval
Dr. Sci. (Engineering), Laboratory Head

Phone: (3822) 49-27-92
Fax: (3822) 49-24-10
E-mail: коval@ opee.hcei.tsc.ru




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