TECHNOLOGIES & APPLICATIONS

VACUUM ION-PLASMA SETUP “DUET”

Vacuum ion-plasma setup "DUET"

The installation provides vacuum arc discharge plasma-assisted deposition of functional coatings on a surface of the most deman-ding parts of units and devices as well as various instruments with the goal of enhancing their life-time and improving the furni-shing.

The installation allows to realize the complex technology in a single vacuum cycle:

finishing ion-plasma cleaning and activation of a surface of articles;
production of a hard (5-7 GPa) nitrided sublayer;
deposition of superhard (20-40 GPa) submicro- and nanostructural composite film (like TiN, etc) of width 3-5 чm.

Setup "DUET" main parameters:
Vacuum chamber dimensions	650x650x750 mm³
Manipulator	12 positions
Operating pressure	10^-1—1 Pa
Plasmagenerator current	up to 80 A
Arc evaporator current	up to 150 A
Bias voltage	up to 1000 V
Power supply:
Mains voltage Number of phases Frequency Power	380/220 V 3 50 Hz up to 50 kW
Water-cooling runoff	not more than 2 m³/h

Advantages

the total technological process of pieces surface modification is realized in vacuum and is ecologically clean;
a non-self-maintained arc discharge allows to efficiently generate a low-temperature plasma over the whole setup operating volume providing high quality of ion-plasma treatment;
a high-adhesive coatings possessing an improved operating performance are formed.

For further information please contact:

Nikolai N. Koval
Dr. Sci. (Engineering), Laboratory Head

Phone: (3822) 49-27-92
Fax: (3822) 49-24-10
E-mail: коval@ opee.hcei.tsc.ru

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