TECHNOLOGIES & APPLICATIONS
EXCIMER LASERS
EL SERIES
PurposeThe device is intended for production of high power short laser radiation pulses in ultra-violet spectrum range. |
|
| radiation wavelength | 193, 248, 308, 351 nm |
| laser pulse energy | up to 1000 mJ |
| pulse duration (FWHM) | 20-35 ns |
| pulse repetition rate | up to 200 Hz |
| average power of radiation | up to 150 W |
| laser beam dimension (FWHM) | 28 ะต (7 - 10) mm |
| beam divergence (FWHM) | 3 x 1.5 mrad |
Laser can be completed by additional optics elements of unstable cavity and master oscillator
Excimer lasers of EL series for 308 nm (XeCl):
EL-200-50, EL-350-10, EL-500-100, EL-700-200.
Area Application
- Semiconductor annealing
- Pulse laser deposition
- Nanocrystalline material production
- Dye laser pumping
- Spectroscopy
- Photochemistry
- Medicine and biology
- Spark gap ignition
- Material treatment
- and etc.
For further information please contact:
Valery F. Losev
Dr. Sci. (Phys. & Math.), Laboratory Head
Phone: (3822) 49-18-91
Fax: (3822) 49-24-10
E-mail: losev@ogl.hcei.tsc.ru
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