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TECHNOLOGIES & APPLICATIONS

EXCIMER LASERS
EL SERIES

Purpose

The device is intended for production of high power short laser radiation pulses in ultra-violet spectrum range.

Parameters
radiation wavelength193, 248, 308, 351 nm
laser pulse energyup to 1000 mJ
pulse duration (FWHM)20-35 ns
pulse repetition rateup to 200 Hz
average power of radiationup to 150 W
laser beam dimension (FWHM)28 ะต (7 - 10) mm
beam divergence (FWHM)3 x 1.5 mrad

Laser can be completed by additional optics elements of unstable cavity and master oscillator

Excimer lasers of EL series for 308 nm (XeCl):
EL-200-50, EL-350-10, EL-500-100, EL-700-200.

Area Application

  • Semiconductor annealing
  • Pulse laser deposition
  • Nanocrystalline material production
  • Dye laser pumping
  • Spectroscopy
  • Photochemistry
  • Medicine and biology
  • Spark gap ignition
  • Material treatment
  • and etc.

For further information please contact:


Valery F. Losev
Dr. Sci. (Phys. & Math.), Laboratory Head

Phone: (3822) 49-18-91
Fax: (3822) 49-24-10
E-mail: losev@ogl.hcei.tsc.ru




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