TECHNOLOGIES & APPLICATIONS
VACUUM PULSED ELECTRON-BEAM SETUP "SOLO"
VACUUM PULSED ELECTRON-BEAM SETUP "SOLO"
An electron beam is an effective source of ultraspeed surface heating of materials and articles.
Purpose:
- smoothing of a microrelief by means of flashing a surface layer of articles made by methods of electro-spark machining, turning, millings;
- surface modification of materials by pulse quenching.
Generation of an electron beam is carried out with use of the plasma cathode with grid stabilization of emission boundary that provides:
- a high energy efficiency;
- a wide range of control for parameters of the beam.
The setup is consisting of:
- a low-energy pulse electron source;
- a working chamber with vacuum pumping system;
- a high-voltage power supply box;
- a control rack.
| Diameter of the vacuum chamber | 700 mm |
| Length of the vacuum chamber | 500 mm |
| Operating pressure | 10-2 Pa |
| Beam diameter | 1—3 cm |
| Beam current | 20—200 A |
| Electron energy | 5—15 keV |
| Pulse duration | 30—50 µs |
| Pulse repetition rate | 1—5 s-1 |
Fields of application:
- research, technological, developmental, educational establishments where new technologies are developed and studied;
- industrial enterprises where metal working is used.
The use of "Solo" setup allows:
- to reduce a surface roughness of metal articles in up to 10 times;
- to increase a surface microhardness of metal parts and articles in up to 2-3 times;
- to realize a modification of the surface layer of metal articles of depth up to several tens micrometers.
There is possibility of design modernization and change of parameters depending on characteristic properties of its specific applications.
For further information please contact:
Nikolai N. Koval
Dr. Sci. (Engineering), Laboratory Head
Phone: (3822) 49-27-92
Fax: (3822) 49-24-10
E-mail: ъюval@ opee.hcei.tsc.ru
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